The design of this mirror has been optimized for use with ultrashort pulse lasers as a high reflectance mirror at 45° angle of incidence for a very broad wavelength range. Designed to reflect over 99.6% from 680 to 1340 nm, this mirror can be used with Spectra-Physics Insight TM lasers. Careful thin film design and advanced coating processes result in a mirror with maximum reflectivity, maximum bandwidth and minimum pulse dispersion. These mirrors are available optimized for S or P polarizations. 



Specifications


Material Fused Silica
Surface Flatness S1 ≤λ/10 at 632.8 nm over the clear aperture
Clear Aperture ≥ central 80% of diameter
Surface Quality 20-10 scratch-dig
Diameter Tolerance +0/-0.15 mm
Thickness Tolerance ±0.15 mm
Wedge < 10 arc min
Chamfers 0.5-0.75 mm face width x 45 ±15°
Angle of Incidence 45° ± 3°
S1 Coating UF.55P: Rp>99.6% @ 670-1340 nm
UF.55S: Rs>99.7% @ 670-1340 nm
S2 Coating None
Durability MIL-C-675C, moderate abrasion
Cleaning Non-abrasive method, acetone or isopropyl alcohol
on lens tissue recommended (see How to Clean Optics)


UF.55P coating for P polarization

G0382-041

UF.55S coating for S polarization

G0382-042

Theoretical GDD for UF.55 Coating

GDD-Curves