The FSW19AR.15 is a 200 to 700 nm antireflection coated, 12.5 mm in diameter and 2.0 mm thick UV Fused Silica window with λ/10 transmitted wavefront distortion. UV fused silica is the best choice to use in the ultraviolet region down to 195 nm due to its extraordinary high optical transmissivity for ultraviolet light. Fused silica is ideally used in high-energy laser applications with its high laser damage resistance. Its low thermal expansion coefficient allows the window to withstand very high operating temperatures, making this window an excellent choice for more demanding applications.

• 直径

  12.5 mm

• 材料

  UV Grade Fused Silica

• 增透膜

  250-700 nm

• 表面平面度

  λ/10 @ 632.8 nm

• 表面质量

  20-10 scratch-dig

• 厚度

  2.0 mm  

• 厚度公差

  ± 0.1 mm

• 波前畸变

  λ/10 @ 632.8 nm

• 平行度

  <5 arc seconds

• 清洁

  See How to Clean Optics

• 通光孔径

  Central 80% of diameter

• 直径公差

  +0.0/-0.2 mm

• 镀膜代码

  AR.15

• 损伤阈值

  3 J/cm2 @ 355nm, 10ns
  5 J/cm2 @ 532nm, 10ns

FSW19AR。15是一个200到700纳米防反射涂层,直径12.5毫米和2.0毫米厚紫外线石英窗口与λ/ 10传播波前畸变。紫外光熔接二氧化硅是紫外光的最佳选择，因为它的紫外光透过率非常高。熔融二氧化硅以其高的抗激光损伤性在高能激光领域得到了广泛的应用。它的低热膨胀系数允许窗口能够承受非常高的工作温度，使这个窗口是一个优秀的选择，更苛刻的应用。